Apparatus for photoresist stripping

Details Apparatus for photoresist stripping Apparatus for photoresist stripping

1988-01-11

1989-12-05

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

134 1, 134 34, 134105, 156643, 156646, 156655, 156668, B44C 122, B29C 3700, C03C 1500, C03C 2506

Patent

active

048850470

ABSTRACT:
An apparatus for rapidly stripping a photoresist which utilizes an oxidizing fluid such as ozone. A very thin layer of oxidizing fluid of four millimeters or less is flowed over the photoresist. The fluid flows at high velocity over the resist, while the resist is heated. Additionally, the resist may be irradiated with ultraviolet radiation at an irradiance of at least about 800 milliwatts/cm.sup.2.

REFERENCES:
patent: 3890176 (1975-06-01), Bolon
patent: 4028135 (1977-06-01), Vig et al.
patent: 4292384 (1981-09-01), Shraughan et al.
patent: 4341592 (1982-07-01), Shortes et al.
patent: 4544446 (1985-10-01), Cady
Photoresist Stripping with the UV-1 Dry Stripper, pp. 1-2, FIGS. 1-3.
UV Resist--Stripping for High--Speed and Damage--Free Process by Ozawa et al., pp. 125-128.
Zafonte et al., "UV/Ozone Cleaning for Organics Removal on Silicon Wafers", SPIE, vol. 470, Optical Microlithograph III: (1984), pp. 164-175.
Vig, "UV/Ozone Cleaning of Surfaces", pp. 235-254.

Affiliated with

Also associated with

Rating

Apparatus for photoresist stripping does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for photoresist stripping, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for photoresist stripping will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2032474