Apparatus for photolithography process with gas-phase pretreatme

Details Apparatus for photolithography process with gas-phase pretreatme Apparatus for photolithography process with gas-phase pretreatme

1998-09-01

2000-08-22

Rutledge, D.

Photography

Fluid-treating apparatus

Gaseous-treating

396604, 396611, G03D 700, G03D 500

Patent

active

061061670

ABSTRACT:
The present invention discloses an apparatus for photolithography process with phase-pretreatment. The apparatus comprises several chambers: a vapor prime chamber, a vacuum-bake chamber, a chill-plate chamber, a coater chamber and a stepper chamber. Further, an interface chamber is between the stepper chamber and the apparatus. These chambers are connected together to a track system. A base gas is introduced into one of these chambers to perform a gas-phase pretreatment. The concentration of the base gas can be controlled and the processing time of the pretreatment process is well controlled by operating the apparatus. As a photoresist layer is applied on a substrate, the photoresist layer is hardened in the base gas to increase the depth of focus in photolithography process.

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