Apparatus for photochemically ashing a photoresist

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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156643, 156646, 156655, 156668, 134 1, B44C 122, B29C 3700

Patent

active

051767821

ABSTRACT:
An apparatus for photochemically decomposing a photoresist is disclosed wherein processing time can be minimized by inducing a uniform photochemical oxidative decomposing reaction over the whole surface of a base board, and an ozone gas atmosphere can be utilized efficiently. The apparatus includes a rotatable circular table supporting one or more base boards and an ashing platform arranged around the periphery of the table including an ozone feeding slit and an ozone discharge slit. The apparatus also includes a plurality of ultraviolet ray lamps arranged inside a box-shaped vessel located above the ashing platform. An upper cover plate is pivotally mounted on the ashing platform and includes a transparent window plate through which the ultraviolet rays pass to irradiate the base boards. An airtight flat space is formed between the ashing platform and the upper cover to contain the ozone atmosphere.

REFERENCES:
patent: 4885047 (1989-12-01), Ury et al.
patent: 5071485 (1991-12-01), Matthews et al.

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