Apparatus for performing growth of compound thin films

Coating apparatus – Gas or vapor deposition – With treating means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118726, 118715, 4272557, C23C 1308

Patent

active

043899730

ABSTRACT:
A method and an apparatus are provided for performing growth of compound thin films by alternately repeating separate surface reactions of the substances comprising the compound. A carrier gas affects a diffusion barrier between the surface reaction steps to be separated from each other. The gas phase diffusion barrier is also applied to separate the source regions of different reacting vapors both from each other and from the surface reaction zone.

REFERENCES:
patent: 3602192 (1971-08-01), Grockowski
patent: 3721583 (1973-03-01), Blakeslee
patent: 3825439 (1974-07-01), Tick
patent: 3964937 (1976-06-01), Post et al.
patent: 4015558 (1977-04-01), Small et al.
patent: 4048955 (1977-09-01), Anderson

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for performing growth of compound thin films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for performing growth of compound thin films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for performing growth of compound thin films will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-929044

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.