Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1981-08-26
1983-09-20
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118719, 136258, C23C 1500
Patent
active
044054351
ABSTRACT:
An apparatus for performing continuous treatment in vacuum including an inlet chamber, a first intermediate chamber, at least one vacuum treating chamber, a second intermediate chamber and a withdrawing chamber arranged in the indicated order in a direction in which base plates are successively transferred. An opening device normally closed and opened when a base plate is transferred therethrough is mounted on a wall at the inlet of the inlet chamber, between the adjacent chambers and on a wall at the outlet side of the withdrawing chamber. A conveyor device for conveying each base plate in a horizontal direction through the opening device is mounted in each of the chambers, and an evacuating device is also mounted in each chamber. A base plate storing device for storing a plurality of base plates in a magazine is mounted in the first and second intermediate chambers. At least one vacuum treating device is mounted in the vacuum treating chamber.
REFERENCES:
patent: 3584847 (1971-06-01), Hammond
patent: 3968018 (1976-07-01), Lane et al.
patent: 4015558 (1977-04-01), Small et al.
patent: 4274936 (1981-06-01), Love
Barber, IBM Tech. Disc Bull. 11 (1968), p. 757.
Abe Katsuo
Aiuchi Susumu
Kamei Tsuneaki
Kobayashi Shigeru
Nakatsukasa Masashi
Anelva Corporation
Demers Arthur P.
Hitachi , Ltd.
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