Apparatus for performing a plasma enhanced chemical vapor deposi

Details Apparatus for performing a plasma enhanced chemical vapor deposi Apparatus for performing a plasma enhanced chemical vapor deposi

1987-04-27

1988-10-11

Pianalto, Bernard

Coating apparatus

Gas or vapor deposition

Having means to expose a portion of a substrate to coating...

118723, C23C 1600

Patent

active

047762985

ABSTRACT:
Apparatus for performing a plasma enhanced chemical vapor deposition on an edge of a polycarbonate sheet includes a conduit having an axially disposed slit therethrough for engaging the sheet so as to position the edge in the conduit. Axially disposed electrodes are attached to the conduit and positioned to be on generally opposite sides of the edge. Means are provided for applying a separate electrical potential to each of the electrodes, and at least one aperture is provided in the conduit for introducing and removing a gas therefrom.

REFERENCES:
patent: 3713869 (1973-01-01), Geffcken et al.
patent: 4096315 (1978-06-01), Kubacki
patent: 4200681 (1980-04-01), Hall et al.
patent: 4210699 (1980-07-01), Schroeter et al.
patent: 4328646 (1982-05-01), Kaganowicz

Affiliated with

Also associated with

Rating

Apparatus for performing a plasma enhanced chemical vapor deposi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for performing a plasma enhanced chemical vapor deposi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for performing a plasma enhanced chemical vapor deposi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1951497