Apparatus for particle reduction in semiconductor processing equ

Brushing – scrubbing – and general cleaning – Implements – Fabric

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

152101, A47L 1346

Patent

active

061347426

ABSTRACT:
A cleaning handle is used to clean semiconductor processing equipment to reduce particles. A relatively thin handle is formed for insertion into difficult to reach areas and includes slots for affixing a cleaning wipe. The wipe is fed through the slots and wrapped around the handle to secure the wipe for cleaning the equipment, while preventing damage to the equipment. The wipe may be moistened with a cleaning agent to further enhance the cleaning ability of the handle.

REFERENCES:
patent: 825400 (1906-07-01), Lightbrown
patent: 1918101 (1933-07-01), Henriquez
patent: 3571837 (1971-03-01), Weaver
patent: 4709655 (1987-12-01), Van Mastrigt
patent: 5268034 (1993-12-01), Vukelic
patent: 5271995 (1993-12-01), Paley et al.
patent: 5320900 (1994-06-01), Oathout
patent: 5516732 (1996-05-01), Flegal
patent: 5607515 (1997-03-01), Takahashi
patent: 5679405 (1997-10-01), Thomas et al.
patent: 5809607 (1998-09-01), Elson et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for particle reduction in semiconductor processing equ does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for particle reduction in semiconductor processing equ, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for particle reduction in semiconductor processing equ will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1951368

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.