Apparatus for optical inspection of wafers during processing

Details Apparatus for optical inspection of wafers during processing Apparatus for optical inspection of wafers during processing

2007-01-30

2007-01-30

Morgan, Eileen P. (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

By optical sensor

C451S041000, C451S054000, C451S287000, C156S345130, C156S345160

Reexamination Certificate

active

10860019

ABSTRACT:
The present invention is aimed to provide a measurement system installable within a processing equipment and more specifically within the exit station of a polishing machine. The optical scheme of this system includes a spectrophotometric channel, an imaging channel and also means for holding the wafer under measurement.

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