Apparatus for mounting workpieces

Details Apparatus for mounting workpieces Apparatus for mounting workpieces

1988-03-21

1989-09-26

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

156345, 2041921, 414222, 414225, C23C 1434

Patent

active

048698016

ABSTRACT:
In an apparatus for mounting discoidal substrates in a vacuum chamber for reactive ionic etching purposes, a substrate holder joined to a hollow shaft and a bottom plate under the substrate holder are disposed, which together with spacers and a clamping ring form a displaceable cage partially surrounding the substrate holder and held coaxial to the latter, while the substrate which can be introduced through a gap in the lateral wall of the cage betwen two spacers can be laid on the substrate holder and locked in place there by the clamping ring after a relative movement between the substrate holder and the cage.

REFERENCES:
patent: 4439261 (1984-05-01), Pavone et al.
patent: 4523985 (1985-06-01), Dimock
patent: 4654106 (1987-03-01), Davis et al.
patent: 4701251 (1987-10-01), Beardow

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