Apparatus for mounting crystal

Details Apparatus for mounting crystal Apparatus for mounting crystal

1983-02-28

1985-10-15

Paschall, M. H.

Electric heating

Metal heating

By arc

219121PG, 219494, 219501, 219210, 29 2535, 310366, B23K 900, B23K 2300

Patent

active

045476489

ABSTRACT:
A thickness monitor useful in deposition or etching reactor systems comprising a crystal-controlled oscillator in which the crystal is deposited or etched to change the frequency of the oscillator. The crystal rests within a thermally conductive metallic housing and arranged to be temperature controlled. Electrode contacts are made to the surface primarily by gravity force such that the crystal is substantially free of stress otherwise induced by high temperature.

REFERENCES:
patent: 2602872 (1952-07-01), Ziegler
patent: 2765765 (1956-10-01), Bigler et al.
patent: 3006711 (1961-10-01), Silver
patent: 3721841 (1973-03-01), Wilson
patent: 3724739 (1973-04-01), Anderson et al.
patent: 4216371 (1980-08-01), Marotel
patent: 4232239 (1980-11-01), Dworsky et al.
Technical Note, No. 002, published 12/19/71, by Kronos, Inc., entitled "QM-300 Series Scale Factor Considerations".
"Workshop Notes and Short Contributions," Vacuum, vol. 32, No. 5, pp. 305-307, 1982.

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