Coating apparatus – With vacuum or fluid pressure chamber
Patent
1976-01-30
1977-07-19
Stein, Mervin
Coating apparatus
With vacuum or fluid pressure chamber
118 9, 118 491, 427 10, 427248R, C23C 1308
Patent
active
040361675
ABSTRACT:
Apparatus is disclosed for utilizing a low energy electron beam to permit monitoring the rate of deposition and composition of the evaporant particles in a vacuum deposition system. This is accomplished by passing a sample of the evaporant employed in the vacuum deposition process through an enclosure defining a flow path for the evaporant sample which crosses the path of a relatively low energy electron beam which is sufficient to excite the electrons of the atoms constituting the vaporized particles in the deposition chamber. The outer-shell electrons of the atoms constituting the evaporant, after excitation, drop back to a lower energy state in the course of which photons are released which are characteristic of given materials. The enclosure is formed with an optical opening receiving the photons in a path orthogonal with respect to the excitation beam and evaporant sample path, and a photodetector is optically coupled to the opening for sensing the emitted photons. A filter or monochromator is used to select a specific emission line. The resulting electrical signal produced by the photodetector is employed either to provide a readout of the signal detected and/or to actuate control circuitry regulating the operation of the vapor deposition equipment.
REFERENCES:
patent: 3168418 (1965-02-01), Payne, Jr.
patent: 3586854 (1971-06-01), Zega
patent: 3612859 (1971-10-01), Schumacher
patent: 3734620 (1973-05-01), Cade
Fiddler Robert W.
Inficon Leybold-Heraeus Inc.
Stein Mervin
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