Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-02-28
2006-02-28
Mehta, Bhavesh M. (Department: 2625)
Image analysis
Applications
Manufacturing or product inspection
C382S190000, C382S273000, C356S335000, C356S337000, C700S108000, C700S121000, C438S016000, C250S261000
Reexamination Certificate
active
07006682
ABSTRACT:
There is provided an apparatus for monitoring a size of a particle, including (a) a laser beam source which radiates a laser beam to an area in which particles exist, (b) a photodetector which receives the laser beam having been scattered by the particles, and outputs image data including brightness of pixels, (c) an area detector which detects pixels corresponding to an area on which the scattered laser beam is incident, based on the image data, (d) a maximum brightness detector which detects a maximum brightness among brightness of the pixels detected by the area detector, and (e) a measurement unit which compares the maximum brightness to a predetermined threshold brightness to thereby measure a relative size of the particles.
REFERENCES:
patent: 4263508 (1981-04-01), Leary et al.
patent: 4633714 (1987-01-01), Mazumder et al.
patent: 4740708 (1988-04-01), Batchelder
patent: 4798465 (1989-01-01), Knollenberg
patent: 4830494 (1989-05-01), Ishikawa et al.
patent: 5316983 (1994-05-01), Fujimori et al.
patent: 5471298 (1995-11-01), Moriya
patent: 5576827 (1996-11-01), Strickland et al.
patent: 5861951 (1999-01-01), Uesugi et al.
patent: 5870189 (1999-02-01), Uesugi et al.
patent: 5929980 (1999-07-01), Yamaguchi et al.
patent: 5946092 (1999-08-01), DeFreez et al.
patent: 6366690 (2002-04-01), Smilansky et al.
patent: 6368567 (2002-04-01), Comita et al.
patent: 4-54440 (1992-02-01), None
patent: 5-273110 (1993-10-01), None
patent: 6-82358 (1994-03-01), None
patent: 7-55692 (1995-03-01), None
patent: 9-243549 (1997-09-01), None
patent: 10-10036 (1998-01-01), None
patent: 10010036 (1998-01-01), None
patent: 10-232196 (1998-09-01), None
patent: 10232196 (1998-09-01), None
patent: 11-44654 (1999-02-01), None
Uesugi et al., “Real-time monitoring of scattered laser light by a single particle of several tens of nanometers in the etching chamger in relation to its status with the equipment,” J Vac Sci Techn. A 16(3), May/Jun. 1998, p. 1189-1195.
G.S. Selwyn, “Plasma Particulate Contamination Control. I. Transport and Process Effects”, J. Vac. Sci. Technol. B 9 (6), Nov./Dec. 1991, pp. 3487-3492.
Ito Natsuko
Moriya Tsuyoshi
Uesugi Fumihiko
Mehta Bhavesh M.
Seth Manav
Sughrue & Mion, PLLC
LandOfFree
Apparatus for monitoring particles and method of doing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for monitoring particles and method of doing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for monitoring particles and method of doing the same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3698233