Apparatus for monitoring ion beams with an electrically isolated

Details Apparatus for monitoring ion beams with an electrically isolated Apparatus for monitoring ion beams with an electrically isolated

1993-09-21

1995-12-12

Berman, Jack I.

Radiant energy

With charged particle beam deflection or focussing

With detector

H01J 312

Patent

active

054752310

ABSTRACT:
An apparatus for monitoring ion beams with an electrically isolated aperture includes an ion beam source for generating an ion beam and an electrically conductive aperture plate arranged to collimate the ion beam. The aperture plate is electrically isolated from the rest of the deposition apparatus and is divided into a plurality of electrically isolated segments. A current monitoring device has an input connected to the aperture plate so as to monitor current from the aperture plate which is indicative of the ion beam performance.

REFERENCES:
patent: Re33193 (1990-04-01), Yamaguchi et al.
patent: 4118630 (1978-10-01), McKenna et al.
patent: 4135097 (1979-01-01), Forneris et al.
patent: 4628209 (1986-12-01), Wittkower
patent: 4633172 (1986-12-01), Ekdahl, Jr. et al.
patent: 4939371 (1990-07-01), Goto
patent: 4992742 (1991-02-01), Okuda et al.
patent: 5025167 (1991-06-01), Okuda et al.

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