Apparatus for monitoring epitaxial growth

Coating apparatus – With indicating – testing – inspecting – or measuring means – With means for visual observation

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118730, H01L 21203

Patent

active

047321083

ABSTRACT:
The present invention is directed to apparatus for monitoring epitaxial crystalline growth mounted in a vacuum chamber, said apparatus including a support for mounting a single crystal substrate surface, a device for applying epitaxial material to the substrate surface, a device for impinging an electron beam upon the substrate surface to emit secondary electrons therefrom, and a system for detecting the secondary electrons emitted and for outputting a corresponding signal.

REFERENCES:
patent: 3019336 (1962-01-01), Johns
patent: 4575462 (1986-03-01), Dobson et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for monitoring epitaxial growth does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for monitoring epitaxial growth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for monitoring epitaxial growth will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-436269

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.