Apparatus for monitoring and controlling a flat zone in a furnac

Measuring and testing – Gas analysis – Moisture content or vapor pressure

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G01K 706

Patent

active

042429072

ABSTRACT:
An apparatus for monitoring or controlling the temperature profile of a kiln or furnace is provided by utilizing a thermocouple array that generates an emf that is indicative of the temperature differential between a monitoring point or points and a chosen reference point in the furnace. The thermocouple array is structured so that an absolute temperature indication is provided at the chosen reference point and the other monitoring points are shown to be either higher or lower than the reference. The thermocouple array may be made in a wire and bead arrangement, or by thick film printing techniques. The EMF output of the array is multiplexed and applied to a CRT-type display wherein the degree of difference (either positive or negative) between each monitoring point and a reference is readily observed and can be easily compensated.

REFERENCES:
patent: 3280312 (1966-10-01), Sandelien
patent: 3540280 (1970-11-01), Schoenlaub
patent: 3688295 (1972-08-01), Tsoras et al.
patent: 4130019 (1978-12-01), Nitschke

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