Apparatus for metal organic chemical vapor deposition

Details Apparatus for metal organic chemical vapor deposition Apparatus for metal organic chemical vapor deposition

1986-07-14

1988-04-12

Bueker, Richard R.

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118728, 118730, C23C 1600

Patent

active

047367059

ABSTRACT:
A metal organic chemical vapor deposition reactor 10 which includes a flat plate flow channel gas delivery system 18. The gas delivery system comprises slotted rods 40, 42 which pass through an assembly 46 of seal plates 52 and gas directing plates 50. Gas directing plates 52 provide separate flow channels for reactant gases in rods 40 and 42. Reactants are directly jetted from the gas directing plates onto a substrate 20 prior to mixing.

REFERENCES:
patent: 3647197 (1972-03-01), Holloway
patent: 3785853 (1974-01-01), Kirkman
patent: 4116733 (1978-09-01), Olsen et al.
patent: 4314873 (1982-02-01), Wieder et al.
patent: 4368098 (1983-01-01), Manasevit

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