Apparatus for measuring the thickness of thin layers

X-ray or gamma ray systems or devices – Specific application – Fluorescence

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Details

378206, G01B 1502, G01N 2320, G01K 100

Patent

active

045970939

ABSTRACT:
The apparatus measures the thickness of thin layers according to the X-ray fluorescence principle. It has an X-ray beam generator which emits an X-ray beam along a longitudinal geometrical axis, a table device arranged to support a layer which is to be measured, a diaphragm device of a material which absorbs X-rays completely, having a through-aperture which is moveable into the longitudinal geometrical axis, a light source for visible light which can be directed onto the region for the layer, a monocular microscope arrangement for viewing the region of the layer on which the X-ray beam falls, and a deflecting mirror in the optical path between the monocular microscope arrangement and the region of the layer. The diaphragm device is composed of a glass which is transparent to visible light, and has several through-bores therein of different cross-sectional geometry. Means are provided for guiding the diaphragm device in a manner such that one of the through-bores can be at all times, in line with the longitudinal geometrical axis of the X-ray beam. The deflecting mirror is composed of a material which, in practical terms, does not absorb X-rays, and the longitudinal geometrical axis of the X-ray beam passes through it. The monocular microscope arrangement forms sharp images of both the diaphragm device and the region of the layer. An aiming device is provided in the monocular microscope arrangement, having an aiming point intersecting the longitudinal geometrical axis of the X-ray beam, in the optical-path direction, at the point where the longitudinal geometrical axis of the X-ray beam passes through the deflecting mirror.

REFERENCES:
patent: 3717768 (1973-02-01), Edholm et al.
patent: 4406015 (1983-09-01), Koga
patent: 4521905 (1985-06-01), Hosokawa

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