Apparatus for measuring the thickness of a thin film with angle

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

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Details

250236, 250237G, 356357, G01N 2186, H01J 314

Patent

active

048930245

ABSTRACT:
An apparatus for measuring the thickness of a thin film utilizing an interferometric method includes a light source for generating a monochromatic light beam, a scanner for scanning the light beam on a thin film in such a manner that an incident angle thereto is continuously varied from .alpha. to (-.alpha.), a first detector for detecting the incident angle of the light beam and a second detector for detecting an interference pattern caused by light beams reflected from the top and bottom surfaces of the thin film. The thickness of the thin film is obtained in accordance with a geometrical optical relationship defined between adjacent fringes contained in the detected interference pattern.

REFERENCES:
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patent: 3319515 (1967-05-01), Flournoy
patent: 3551056 (1970-12-01), Fay et al.
patent: 4129384 (1978-12-01), Walker et al.
patent: 4453828 (1984-06-01), Hershel et al.
patent: 4518998 (1985-05-01), Warner
patent: 4660980 (1987-04-01), Takabayashi et al.

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