Apparatus for measuring the refractive index of a substrate for

Details Apparatus for measuring the refractive index of a substrate for Apparatus for measuring the refractive index of a substrate for

1987-03-03

1988-12-20

Rosenberger, R. A.

Optics: measuring and testing

Refraction testing

356367, G01N 2121, G01N 2141

Patent

active

047922273

ABSTRACT:
An apparatus (31) and method for measuring the refractive index of an optical recording medium substrate (34) wherein an angle of incidence of a polarized beam (33) is set at an oblique angle of incidence with the substrate (34), the polarized direction of the polarized beam (33) is varied for the substrate (34) in this state, the transmitted or reflected light beam by the substrate is received by a light receiving means (36) through a light analyzer means (35) in the crossed Nichol state and the received light amount for the polarized angle is measured and is compared with a theoretical formula so that the refractive index in the thickness direction of the substrate can be measured.

REFERENCES:
patent: 3724952 (1973-04-01), Vossberg
patent: 4053232 (1977-10-01), Dill et al.
McCrackin et al. "Measurement of the Thickness and Refractive Index of Very Thin Films and the Optical Properties of Surfaces by Ellipsometry", Journal of Research of the National Bureau of Standards, vol. 67A, No. 4, (Jul.-Aug. 1963).

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