Apparatus for measuring the depth of fine engraved patterns

Details Apparatus for measuring the depth of fine engraved patterns Apparatus for measuring the depth of fine engraved patterns

1984-12-24

1986-10-07

McGraw, Vincent P.

Optics: measuring and testing

By polarized light examination

With light attenuation

356446, 356355, G01B 1122

Patent

active

046156208

ABSTRACT:
An apparatus for measuring in a non-contact manner the depth of pits and grooves formed by etching in periodic patterns on the surface of a substrate. The measurement is based on the detection of the intensity of a diffraction ray excluding that of the 0th order through the irradiation of a light beam with variable wave length to the sample. Whereas, the conventional measuring system is sensitive to a diffraction ray of the 0th order, i.e., the major component of the reflected light, that hampers the detection of a higher order diffraction ray carrying information of the depth.

REFERENCES:
patent: 4303341 (1981-12-01), Kleinknecht et al.
patent: 4498772 (1985-02-01), Jastrzebski et al.
"Optical Monitoring of the Etching of SiO.sub.2 and Si.sub.3 N.sub.3 on Si by the Use of Grating Test Patterns", Kleinknecht et al, Solid-State Science and Technology, 5-1978, pp. 798-803.

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