Apparatus for measuring temperatures of a wafer using...

Thermal measuring and testing – Temperature measurement – In spaced noncontact relationship to specimen

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C374S121000, C374S141000

Reexamination Certificate

active

10398652

ABSTRACT:
An apparatus (295) using specular reflection spectroscopy to measure a temperature of a substrate (135). By reflecting light (100) from a substrate, the temperature of the substrate can be determined using the band-edge characteristics of the substrate. This in situ apparatus can be used as a feedback control in combination with a variable temperature substrate holder to more accurately control the processing conditions of the substrate. By utilizing a multiplicity of measurement sites, the variation of the temperature across the substrate can also be measured.

REFERENCES:
patent: 4311725 (1982-01-01), Holland
patent: 4389970 (1983-06-01), Edgerton
patent: 4576485 (1986-03-01), Lambert
patent: 4671651 (1987-06-01), Toyoda et al.
patent: 4749254 (1988-06-01), Seaver
patent: 4789992 (1988-12-01), Wickersheim et al.
patent: 4989970 (1991-02-01), Campbell et al.
patent: 5118200 (1992-06-01), Kirillov et al.
patent: 5255286 (1993-10-01), Moslehi et al.
patent: 5265957 (1993-11-01), Moslehi et al.
patent: 5322361 (1994-06-01), Cabib et al.
patent: 5388909 (1995-02-01), Johnson et al.
patent: 5474381 (1995-12-01), Moslehi
patent: 5568978 (1996-10-01), Johnson et al.
patent: 5636258 (1997-06-01), Okumura et al.
patent: 5645351 (1997-07-01), Nakata et al.
patent: 5715361 (1998-02-01), Moslehi
patent: 5772323 (1998-06-01), Felice
patent: 5823681 (1998-10-01), Cabib et al.
patent: 5841110 (1998-11-01), Nenyei et al.
patent: 5874711 (1999-02-01), Champetier et al.
patent: 5876121 (1999-03-01), Burns et al.
patent: 5938335 (1999-08-01), Yam
patent: 5997175 (1999-12-01), Champetier et al.
patent: 6062729 (2000-05-01), Ni et al.
patent: 6090210 (2000-07-01), Ballance et al.
patent: 6129807 (2000-10-01), Grimbergen et al.
patent: 6151446 (2000-11-01), Hunter et al.
patent: 6174081 (2001-01-01), Holm
patent: 6293696 (2001-09-01), Guardado
patent: 6393210 (2002-05-01), Wu
patent: 6479801 (2002-11-01), Shigeoka et al.
patent: 6481886 (2002-11-01), Narendrnath et al.
patent: 6563092 (2003-05-01), Shrinivasan et al.
patent: 6799137 (2004-09-01), Schietinger et al.
patent: 6830942 (2004-12-01), Alers et al.
patent: 6839507 (2005-01-01), Adams et al.
patent: 2001/0006530 (2001-07-01), Adams et al.
patent: 2001/0014111 (2001-08-01), Shimizu
patent: 2001/0047879 (2001-12-01), Jiwari et al.
patent: 2002/0004309 (2002-01-01), Collins et al.
patent: 2002/0125223 (2002-09-01), Johnson et al.
patent: 2002/0189757 (2002-12-01), Denton et al.
patent: 57-79417 (1982-05-01), None
patent: 57-197433 (1982-12-01), None
C.D. Thurmond: “The standad thermodynamic functions for the formation of electrons and holes In Ge, Si, GaAs, and GaP” J. Electrochem. Soc., vol. 122, p. 1133, 1975.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for measuring temperatures of a wafer using... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for measuring temperatures of a wafer using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for measuring temperatures of a wafer using... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3876522

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.