Chemical apparatus and process disinfecting – deodorizing – preser – Analyzer – structured indicator – or manipulative laboratory... – Means for analyzing liquid or solid sample
Patent
1989-08-07
1992-03-24
Lacey, David L.
Chemical apparatus and process disinfecting, deodorizing, preser
Analyzer, structured indicator, or manipulative laboratory...
Means for analyzing liquid or solid sample
422110, 422112, 422115, 356 37, 356335, 356336, 356337, 377 11, 377 12, 239 74, 137115, G01N 1512, G01N 1514
Patent
active
050986570
ABSTRACT:
An apparatus for measuring nonvolatile residue concentrations in liquid is disclosed. A plurality of fixed and adjustable flow restrictive elements are utilized and arranged in-line from a fluid supply source to provide a constant, pressure controlled flow of liquid to the measuring apparatus and allow for real-time measurements and optimal concentration detection. An atomizer atomizes the liquid into droplets which are dried to nonvolatile residue particles. The nonvolatile residue particle concentration is then determined utilizing an electrostatic aerosol detector. The invention further discloses apparatus for collecting a sample of nonvolatile residue for analysis and identification using a corona precipitator.
REFERENCES:
patent: 3476729 (1969-11-01), Smith et al.
patent: 3765771 (1973-10-01), Shaw
patent: 3854321 (1974-12-01), Dahneke
patent: 3984296 (1976-10-01), Richards
patent: 4173415 (1979-11-01), Wyatt
patent: 4284496 (1981-08-01), Newton
patent: 4361400 (1982-11-01), Gray et al.
patent: 4449816 (1984-05-01), Kohsaka et al.
patent: 4519983 (1985-05-01), Espitalie et al.
patent: 4585169 (1986-04-01), Kinsey
patent: 4761074 (1988-08-01), Kohsaka et al.
patent: 4794086 (1988-12-01), Kasper et al.
patent: 4853618 (1989-08-01), Holley
Blackford, D. B. et al., "A New Method for Measuring Nonvolatile Residue for Ultrapure solvents", J. of Environ. Sci. 30(4) 43-47, 1987.
Perry & Green, "Chemical Engineers Handbook", 6 ed. 1984, Chapter 22-26.
"Particle Characterization", David B. Blackford and Gary R. Simons, dated 22 Sep. 1986.
"Development of a New Continuous Monitor for Nonvolatile Solute in Ultrapure Water by Atomization", The Journal of Environmental Sciences, Kousaka, et al., Jul./Aug., 1987, pp. 39-42.
"Submicron Aerosol Characterization of Water by a Differential Mobility Particle Sizer", Kournikakis et al., J. Aerosol Sci., vol. 19, No. 7, pp. 1425-1428, 1988.
"Development on an On-Line Method for Gauging the Total Weight of Foreign Materials in IC Pure Water", Takahasi et al., Automated Integrated Circuits Manufacturing, Proceeding of the 4th Symposium, Chicago 1988, Proceedings of the Electrochemical Society, pp. 155-162.
"A New Method for Measuring Nonvolatile Residue for Ultrapure Solvents", David B. Blackford et al., The Journal of Environmental Sciences, Jul./Aug. 1987, pp. 43-47.
"Aerosol Generation Method for Measuring Particles Suspended in Water-Detection of Particulate Impurities in Ultrapure Water and Sizing of Fine Powders-", Niida et al., dated 11 Jan. 1988.
"Cleanliness Meter and its Application to Solvent Cleaning", Marsh, Fifth Annual Technical Meeting and Exhibit, Houston, Texas, Mar. 29-Apr. 1, 1966.
"Ultrapure Water Management in Semiconductor Factories Using a Total Evaporation Residue Meter", Tada et al., Journal of Electronics Materials, pp. 107-113, Jun. 1988.
"Development of a Continuous Monitor for Nonvolatile Impurity in Ultrapure Water and Solvents", Sato et al.
"Highpure Monitor", Nomura Micro Science, Pamphlet.
"Aerosol Technology in Hazard Evaluation", Mercer, American Industrial Hygien Association and U.S. Atomic Energy Commission, Production of Test Aerosols 9, pp. 336-367.
"Analysis of High Purity Chemicals: Examination and Improvement of the Residue after Evaporation Test for Solvents", Campbell et al., Analytical Chemistry, vol. 50, No. 7, Jun. 1978, pp. 963-964.
"Standard Test Method for Nonvolatile Matter in Volatile Solvents for Use in Paint, Varnish, Lacquer, and Related Products", American Society for Testing and Materials, D 1353, pp. 1-2.
"Book of SEMI Standards 1985", Semiconductor Equipment and Materials Institute, Incorporated, vol. 1, Chemicals Division, 1985.
"Laboratory Generation of Particulates With Emphasis on Submicron Aerosols", Benjamin Y. H. Liu, Journal of the Air Pollution Control Association, vol. 24, No. 12, pp. 1170-1172, Dec. 1974.
Industrial Test News, TSI Incorporated, vol. 2, Issue 1, p. 4, "Model 8110 Automated Filter Tester".
TSI Journal of Particle Instrumentation, vol. 3, No. 1, pp. 3-9, Jan.-Jun. 1988, "Generation and Maintenance of Process Gases with Extremely Low Particle Levels", Donald C. Grant.
Blackford David B.
Havir Darrell D.
Kerrick Thomas A.
Quant Frederic R.
Sem Gilmore J.
Lacey David L.
Redding David
TSI Incorporated
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