Apparatus for measuring dimensions of micropattern

Details Apparatus for measuring dimensions of micropattern Apparatus for measuring dimensions of micropattern

1986-07-02

1988-05-17

Evans, F. L.

Optics: measuring and testing

By polarized light examination

With light attenuation

250560, 356384, 356387, G01B 1102

Patent

active

047446625

ABSTRACT:
An apparatus for measuring dimensions of a micropattern has a photoelectric sensor for scanning an enlarged image of a pattern and detects the positions of the leading and trailing edges by use of a predetermined slice level from a photoelectric signal which is derived by this sensor, thereby detecting the interval between those edges. The slice level is corrected in accordance with the interval between the edges to be measured. An amount of correction is stored as a predetermined table. A determination is made by an interval discriminating section to see if the correction needs to be performed or not.

REFERENCES:
patent: 4112309 (1978-09-01), Nakazawa et al.
patent: 4568188 (1986-02-01), Weber et al.
"Automatic Mask Pattern Inspection for Printed Circuits . . . ", Nakashima et al., SPIE, vol. 182, p. 38, (1979), Imaging Applications for Automated Industrial Inspection & Assembly.

Affiliated with

Also associated with

Rating

Apparatus for measuring dimensions of micropattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for measuring dimensions of micropattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for measuring dimensions of micropattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1877995