Apparatus for measuring characteristics of thin film by...

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

10489108

ABSTRACT:
The present invention relates to a non-contact, non-destructive measuring apparatus that measures thickness profile and refractive index distribution of a single or multiple layers of thin films by means of the principle of reflectometry. According to the present invention, by employing more than one narrow band-pass optical filters and a two-dimensional array of CCD sensors, and by finding an optimal solution for the nonlinear functional relationship between the thickness of said thin film or thin films and the corresponding refractive indexes by using an iterative numerical computation method, said apparatus simultaneously measures local area-wise thickness profile and refractive index distribution among others of said a single layer or multiple layers of thin films on a substrate.

REFERENCES:
patent: 3804532 (1974-04-01), Patten et al.
patent: 4308586 (1981-12-01), Coates
patent: 4999014 (1991-03-01), Gold et al.
patent: 4999508 (1991-03-01), Hyakumura
patent: 4999509 (1991-03-01), Wada et al.
patent: 5042949 (1991-08-01), Greenberg et al.
patent: 5129724 (1992-07-01), Brophy et al.
patent: 5227861 (1993-07-01), Nishizawa et al.
patent: 5333049 (1994-07-01), Ledger
patent: 5365340 (1994-11-01), Ledger
patent: 5410411 (1995-04-01), Uchida et al.
patent: 5450205 (1995-09-01), Sawin et al.
patent: 5555472 (1996-09-01), Clapis et al.
patent: 5587792 (1996-12-01), Nishizawa et al.
patent: 6057925 (2000-05-01), Anthon
patent: 6130750 (2000-10-01), Ausschnitt et al.
patent: 6639674 (2003-10-01), Sokolov et al.
patent: 1144906 (1997-03-01), None
patent: 07091921 (1995-04-01), None
patent: 2000513102 (2000-10-01), None
patent: 2000310512 (2000-11-01), None
patent: 2001021317 (2001-01-01), None
patent: 2001153620 (2001-06-01), None
patent: 2002090295 (2002-03-01), None
patent: 2001041713 (2006-02-01), None
patent: WO93/17298 (1993-02-01), None
patent: 9845687 (1998-10-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for measuring characteristics of thin film by... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for measuring characteristics of thin film by..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for measuring characteristics of thin film by... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3862554

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.