Apparatus for maximizing light beam utilization

Details Apparatus for maximizing light beam utilization Apparatus for maximizing light beam utilization

1992-10-07

1994-03-01

Albritton, C. L.

Electric heating

Metal heating

By arc

21912168, B23K 2606

Patent

active

052909921

ABSTRACT:
The present invention is an apparatus and method for maximizing light beam utilization in patterning applications by positioning a plurality of mask mirrors in the light beam path to form patterned light onto a plurality of work pieces. Each mask mirror is designed so that a portion of the light beam area needed for exposing a work piece to patterned light is reflected from the mask mirror, while the remainder is passed through the mask mirror to another mask mirror. Alternatively, each mask mirror can be designed so that a portion of the light beam area needed for exposing a work piece to patterned light is passed through the mask mirror, while the remainder is reflected to another mask mirror.

REFERENCES:
patent: 2792740 (1957-05-01), Haynes
patent: 4230408 (1980-10-01), Nigg
patent: 4653903 (1987-03-01), Torigoe et al.
patent: 4661679 (1987-04-01), Pardee
patent: 5223693 (1993-06-01), Zumoto et al.

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