Liquid purification or separation – Processes – Liquid/liquid solvent or colloidal extraction or diffusing...
Patent
1991-08-30
1993-10-05
Dawson, Robert A.
Liquid purification or separation
Processes
Liquid/liquid solvent or colloidal extraction or diffusing...
2101952, 2102572, 210180, 210181, 210900, 210750, B01D 6100
Patent
active
052501833
ABSTRACT:
The present invention provides an apparatus for manufacturing ultra-pure water, characterized in that a decarbonator/degassor and a reverse osmosis equipment for pretreatment of supply water are installed in the upper stream of a multiple effect evaporator. The present invention also provides a method for manufacturing ultra-pure water, characterized in that most of the carbonic groups dissolved in the supply water is degassed by a decarbonating/degassing treatment prior to introducing the water to the multiple effect evaporator, and that most of the scale components such as Ca.sup.++, SO.sub.4.sup.-- and Mg.sup.++ are also eliminated by a reverse osmosis treatment.
REFERENCES:
patent: 3901768 (1975-08-01), Steinbruchel
patent: 3968002 (1976-07-01), Standiford
patent: 4344826 (1982-08-01), Smith
patent: 4795532 (1989-01-01), Mizutani et al.
Patent Abstracts of Japan, vol. 14, No. 242 (C-721) 23 May 1990 & JP-A-2 063 592 (Hitachi Ltd.).
Patent Abstracts of Japan, vol. 10, No. 269 (C-372) 12 Sep. 1986 & JP-A-61 093 897 (Hitachi Zosen Corp.).
Patent Abstracts of Japan, vol. 10, No. 339 (C-385) 15 Nov. 1986 & JP-A-61 141 985 (Mitsubishi Heavy Ind. Ltd.).
Inoue Shiro
Koba Kazunori
Momose Shoichi
Sawada Hidetaka
Suematsu Hideo
Dawson Robert A.
Fortuna Ana M.
Hitachi Zosen Corporation
LandOfFree
Apparatus for manufacturing ultra-pure water does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for manufacturing ultra-pure water, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for manufacturing ultra-pure water will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1001214