Apparatus for manufacturing semiconductors

Details Apparatus for manufacturing semiconductors Apparatus for manufacturing semiconductors

1985-10-28

1987-05-12

Lawrence, Evan K.

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723, 118725, 118729, 118733, C23C 1402, C23C 1456

Patent

active

046640622

ABSTRACT:
In a molecular beam epitaxy apparatus, the loading chamber for introducing the substrates is made separable from both the preparation chamber for cleaning the substrates and the growth chamber for forming thin films onto the respective substrates, so that the evacuation of the loading chamber is possible even when the loading chamber is separated from the apparatus, thus improving the productivity thereof.

REFERENCES:
patent: 3404661 (1968-10-01), Mathias et al.
patent: 4201152 (1980-05-01), Luscher
patent: 4498416 (1985-02-01), Bouchaib

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