Apparatus for manufacturing semiconductor devices with a...

Details Apparatus for manufacturing semiconductor devices with a... Apparatus for manufacturing semiconductor devices with a...

2005-09-06

2005-09-06

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Chemical etching

Having liquid and vapor etching steps

C216S092000

Reexamination Certificate

active

06939807

ABSTRACT:
An apparatus for manufacturing semiconductor devices includes a supporter portion on which a semiconductor substrate is placed, a nozzle portion for injecting a fluid to an edge of the substrate placed on the supporter portion, a shielding cover for preventing the fluid injected from the nozzle portion from flowing to a shielding portion among a pattern-formed portion, and a shielding cover moving portion device for moving the shielding cover up and down. The apparatus makes it possible to prevent a chemical solution injected to the edge of a wafer from flowing to a shielding portion of the wafer when the wafer edge is etched.

REFERENCES:
patent: 6123865 (2000-09-01), Lin et al.
patent: 6733686 (2004-05-01), Hata
patent: 10-214023 (1989-08-01), None
patent: 07-020623 (1995-01-01), None
patent: 10-189421 (1998-07-01), None
patent: 10-199778 (1998-07-01), None
patent: 1999-18792 (1999-06-01), None

Affiliated with

Also associated with

Rating

Apparatus for manufacturing semiconductor devices with a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for manufacturing semiconductor devices with a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for manufacturing semiconductor devices with a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3399138