Apparatus for manufacturing semiconductor devices

Details Apparatus for manufacturing semiconductor devices Apparatus for manufacturing semiconductor devices

1990-11-09

1992-12-08

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 118725, 118730, C23C 1400, H01L 2100

Patent

active

051694786

ABSTRACT:
A thermal reactor for processing semiconductor wafers includes a ring-like reactor body having a cylindrical outer surface and having a central depressed portion to define an inner circular space at the cross section of the reactor body along a longitudinal direction of the reactor body. A wafer holder for mounting the wafers vertically is positioned within the inner circular space and is rotated when a reaction gas is passed from an open bottom end of the reactor body toward a top end of the reactor body. The reaction gas is exhausted through a conduit placed along the outer surface of the reactor body. A plurality of plasma generating electrodes are positioned around the outer surface and within the central depressed portion of the reactor body in order to clean an inner side wall of the reactor body.

REFERENCES:
patent: 3460510 (1969-08-01), Currin
patent: 3704987 (1972-12-01), Arndt et al.
patent: 4263872 (1981-04-01), Ban
patent: 4303467 (1981-12-01), Scornavacca et al.
patent: 4405435 (1983-09-01), Tateishi et al.
patent: 4446817 (1984-05-01), Crawley
patent: 4501766 (1985-02-01), Suzuki et al.
patent: 4526644 (1985-07-01), Fujiyama et al.
patent: 4526805 (1985-07-01), Yoshizawa
patent: 4529474 (1985-07-01), Fujiyama et al.
patent: 4539933 (1985-09-01), Campbell et al.
patent: 4545327 (1985-10-01), Campbell et al.
patent: 4569719 (1986-02-01), Coleman
patent: 4612207 (1986-09-01), Jansen
patent: 4615299 (1986-10-01), Matsuyama et al.
patent: 4624738 (1986-11-01), Westfall et al.
patent: 4638762 (1987-01-01), Kim et al.
patent: 4640223 (1987-02-01), Dozier
patent: 4694779 (1987-09-01), Hammond et al.
patent: 4707210 (1987-11-01), Misumi
patent: 4760244 (1988-07-01), Hokynar

Affiliated with

Also associated with

Rating

Apparatus for manufacturing semiconductor devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for manufacturing semiconductor devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for manufacturing semiconductor devices will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-958661