Apparatus for manufacturing semiconductor device

Details Apparatus for manufacturing semiconductor device Apparatus for manufacturing semiconductor device

1987-08-04

1989-02-07

Yuen, Henry C.

Heating

Processes of heating or heater operation

Including preparing or arranging work for heating

432 6, 432253, 432258, F23D 500

Patent

active

048028428

ABSTRACT:
In a heating furnace for forming films on semiconductor substrates (1), holding means (2, 4) for holding semiconductor substrates (1) are provided with projections (3, 5) for holding at least part of bottom faces of the semiconductor substrates (1) horizontally with predetermined spacing between the projections.

REFERENCES:
patent: 1841641 (1932-01-01), Schreiber
patent: 1920589 (1933-08-01), Payne
patent: 1941941 (1934-01-01), Irwin
patent: 2567609 (1951-09-01), Lovatt
patent: 2923997 (1960-02-01), Emmerling
patent: 4153164 (1979-05-01), Hofmeister et al.
patent: 4167391 (1979-09-01), Lovatt
"High Pressure Oxidation of Silicon by the Pyrogenic or Pumped Water Technique", L. E. Katz et al, Solid State Technology, Dec. 1981, pp. 87-93.

Affiliated with

Also associated with

Rating

Apparatus for manufacturing semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for manufacturing semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for manufacturing semiconductor device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1082398