Apparatus for manufacturing crystals according to the Czochralsk

Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – For crystallization from liquid or supercritical state

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117200, C30B 3500

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active

059481633

ABSTRACT:
A crystal manufacturing apparatus includes a crucible for containing a material, a heater for heating and melting the material, and a heat insulating cylinder arranged so as to surround the crucible and the heater. The crystal manufacturing apparatus is operated in accordance with the Czochralski method. The heat insulating cylinder is arranged to be vertically movable. When two or more crystals are pulled within a single batch, the vertical position of the heat insulating cylinder is changed between the manufacture of the crystals, so that the thermal histories of the crystals are made different from one another. Moreover, when a crystal is pulled in accordance with the Czochralski method, the heat insulating cylinder is moved vertically while the crystal is being pulled.

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N. Fujimaki et al., "Influence of Micro Crytal Defect in Silicon Single Crystal on Gate Oxide Integrity", UCS Semiconductor Substrate Technology Workshop, Ultraclean Technology, vol. 7, Issue 3, pp. 26-33.
F. Shimura, "Semiconductor Silicon Crystal Technology", pp. 178-181, 1989.

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