Apparatus for manufacturing a semiconductor material

Details Apparatus for manufacturing a semiconductor material Apparatus for manufacturing a semiconductor material

1998-12-22

2000-06-13

Jeffery, John A.

Heating

Processes of heating or heater operation

Treating an article, container, batch or body as a unit

432152, 432205, F27D 300

Patent

active

06074202&

ABSTRACT:
An apparatus for manufacturing a semiconductor material includes a load-lock chamber which can contain a cassette for holding at least one wafer for taking the wafer into or out of the apparatus, a process furnace for conducting a treatment to the wafer, and a transfer chamber for transferring the wafer between the load-lock chamber and the process furnace, wherein the apparatus further includes a pressure detector for detecting a pressure difference between in the process furnace and in the transfer chamber, and a gas flow controller for controlling a flow rate of a gas flow supplied to the transfer chamber in accordance with results of detection by the pressure detector.

REFERENCES:
patent: 5407350 (1995-04-01), Iwabuchi et al.

Affiliated with

Also associated with

Rating

Apparatus for manufacturing a semiconductor material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for manufacturing a semiconductor material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for manufacturing a semiconductor material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2063978