Apparatus for manfuacturing a semiconductor layer using rapid th

Details Apparatus for manfuacturing a semiconductor layer using rapid th Apparatus for manfuacturing a semiconductor layer using rapid th

1995-05-23

1996-03-19

Bueker, Richard

Coating apparatus

With indicating, testing, inspecting, or measuring means

118666, 118668, 118708, 118723MW, 118725, B05C 1100

Patent

active

054996023

ABSTRACT:
An apparatus for manufacturing a semiconductor layer using rapid thermal processing, the apparatus comprising: a chamber for processing a wafer; a first microwave source for appling microwave to a center portion of said wafer, being formed on one side of said chamber; and a second microwave source for appling microwave to the edge portion of said wafer, being formed on the other side of said processing chamber; a gas inlet for injecting a processing gas into said processing chamber, being formed in top of said processing chamber; a gas outlet for exhausting said processing gas in said processing chamber.

REFERENCES:
patent: 5134965 (1992-08-01), Tokuda
patent: 5364519 (1994-11-01), Fujimura
patent: 5433789 (1995-07-01), Kakehi

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