Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1976-09-22
1978-03-21
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118 491, 118418, C23C 1500
Patent
active
040802817
ABSTRACT:
An apparatus for making metal films comprises an air tight chamber; a rotatable cylindrical cage to receive substrates therein, said rotatable cage constituting an anode; and cathode means of sputtering metal material disposed coaxially of said rotatable cylindrical cage. When a sputtering power source such as DC power source or asymmetrical AC power source is applied across the cage and the cathode of sputtering metal material, metal atoms are sputtered from the cathode means and then deposited on the substrates in the cage. The cage may have partitions or radial walls provided in a circumferential direction about the axis of rotation, so that the substrates may be received in the cage in a separate manner. Alternatively, the cage may be open at the inner periphery and in this case, the cathode means may be disposed inside of the cage.
REFERENCES:
patent: 182209 (1876-09-01), Mary
patent: 3650737 (1972-03-01), Maissel et al.
patent: 3818982 (1974-06-01), Wagner
patent: 3892651 (1975-07-01), Salisbury et al.
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