Apparatus for making a plasma coating

Details Apparatus for making a plasma coating Apparatus for making a plasma coating

1984-10-31

1986-10-14

Smith, John D.

Coating apparatus

Gas or vapor deposition

With treating means

118728, 118 501, 427 39, H01L 21316

Patent

active

046165975

ABSTRACT:
An improved radio frequency (RF) glow discharge apparatus is disclosed for depositing dielectric films onto substrates in a continuous operation. The apparatus includes one or more capacitively coupled electrodes, with a plate of a dielectric material that overlies the surface of the electrode(s) coupled with the plasma. The thickness of the plate is sufficient such that during deposition with the apparatus of this invention, the amount of material deposited on the electrodes is negligible, and the potential between the electrodes and the substrate remains substantially the same. This, in turn, insures that the chemical structure and properties of the deposited films are reproducible over long periods of operation.

REFERENCES:
patent: 4223048 (1980-09-01), Engle, Jr.
patent: 4329219 (1982-05-01), Druzhinin et al.
patent: 4339471 (1982-07-01), Kaganowicz et al.
patent: 4379943 (1983-04-01), Yang et al.
patent: 4399016 (1983-08-01), Tsukada et al.
patent: 4424096 (1984-01-01), Kumagai
patent: 4514192 (1985-04-01), Verma et al.

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