Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1998-06-02
2000-02-15
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118726, C23C 1434, C23C 1600
Patent
active
060248513
ABSTRACT:
The present invention relies upon a free space magnetic field in a pulsed laser deposition (PLD) chamber for forming high quality thin films made from diverted ions from a plume evaporated from an ablated target illuminated by a pulsed laser beam. The magnetic field exerts a qv X B Lorentz force upon the ions that is orthogonal to the magnetic field and to their direction of travel in the plume, and curves the ions toward the substrate, while neutral particulates continue to pass by the substrate so that the large neutral particulates are not deposited on the substrate. A shield prevents the deposition of plume species in direct line of sight between the target and the substrate so that only charged ions curved by the magnet are deposited on the substrate. A permanent magnet is used to separate charged species from neutral species. The magnetic field deflects the charged species away from the primary direction of travel of the plume and toward the substrate for deposition of the charged ion species on the substrate. The method provides particulate-free films having improved crystallinity, uniformity and adhesion.
REFERENCES:
patent: 5411772 (1995-05-01), Cheung
patent: 5490912 (1996-02-01), Warner et al.
patent: 5820948 (1998-10-01), Itozaki et al.
patent: 5836796 (1998-11-01), Danroc
"Pulsed laser deposition of particulate-free thin films using a curved magnetic filter"; Jordan, et al.; Applied Surface Science 109/110, pp. 403-407, Feb. 1997.
"Transport of vacuum arc plasma through straight and curved magnetic ducts"; Storer, et al.; Journal of Applied Physics 66(11); pp. 5245-5250, Dec. 1989.
Cantelmo Gregg
Nguyen Nam
Reid Derrick Michael
The Aerospace Corporation
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