Coating apparatus – Gas or vapor deposition – With treating means
Patent
1995-12-13
1999-07-27
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118715, 118725, 118729, C23C 1600
Patent
active
059284277
ABSTRACT:
An improved apparatus for a lower pressure chemical vapor deposition capable of achieving various kinds of thin films having a uniform thickness, preventing parts breakage, achieving automation of the system, and combining the use of a low pressure chemical vapor deposition apparatus and a plasma low pressure chemical vapor deposition apparatus, which includes a deposition base; a reactor disposed on the deposition base and having a reaction region formed therein; a substrate lifted and lowered in the reactor and on which a wafer is placed; a chemical source gas introducer for introducing a chemical source gas into the reactor; a substrate heating member disposed in the substrate for heating the wafer; and a reactor heating member for heating the reactor.
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Bueker Richard
Hochberg D. Peter
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