Coating apparatus – Gas or vapor deposition – With treating means
Patent
1986-01-08
1988-11-08
Lawrence, Evan K.
Coating apparatus
Gas or vapor deposition
With treating means
118501, 118728, 21912182, 21912161, 21912173, 21912175, 21912177, C23C 1648, C23C 1652
Patent
active
047827874
ABSTRACT:
An apparatus wherein a beam of substantially coherent light passes through a window in a chamber and then through the chamber in a direction substantially parallel, and contiguous, to substrates in the chamber. The beam ionizes gases in a mixture in the chamber. The ionized gases combine to form a substance which becomes deposited on the substrate(s) as a layer or which etches a previously deposited layer on the substrate. As the beam moves through the chamber, it loses energy. Various individual, or combinations of, compensations for this loss of energy may include the following: (1) the substrate(s) may be tilted slightly to decrease the distance between the beam and the substrate(s) as the beam moves through the chamber; (2) the beam may be tapered in a direction along the substrate(s); (3) the rate and direction of the flow of a mixture of ionizable gases through the chamber may be adjusted; (4) the rate and direction of flow of a gas for neutralizing the ionization of the gases may be adjusted; (5) the rate of flow of the ionizable gases may be individually adjusted for each substrate; (6) the rate and direction of flow of the neutralizing gas may be individually adjusted for each substrate; and (7) the beam may be regulated by splitting it between two compartments of the chamber.
REFERENCES:
patent: 4579750 (1986-04-01), Bowen et al.
patent: 4664057 (1987-05-01), Hemmati
Lawrence Evan K.
Roston Ellsworth R.
Schwartz Charles H.
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