Apparatus for large-area ionic etching

Details Apparatus for large-area ionic etching Apparatus for large-area ionic etching

1992-05-12

1994-03-08

Pal, Asok

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

118723E, 156643, 20429831, 204345, 20429802, 20429815, C23F 102

Patent

active

052923940

ABSTRACT:
An evacuable tank having gas inlet and gas outlet openings, with at least one large-area anode at ground potential and a cathode provided as a substrate holder disposed substantially parallel thereto and connected to a high-frequency voltage source. The anode surface has step-shaped areas each being spaced at a different distance from the cathode in order to maintain a uniform ion concentration and therefore a uniform plasma.

REFERENCES:
patent: 4425210 (1984-01-01), Fazlin

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