Apparatus for ion beam work

Details Apparatus for ion beam work Apparatus for ion beam work

1985-07-15

1987-07-28

Church, Craig E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504911, H01J 37304, H01J 37302

Patent

active

046833781

ABSTRACT:
This invention discloses an ion beam work apparatus which comprises ion mean radiation means for focusing and radiating an ion beam extracted from an ion source to a target put on a moving mechanism, and scanning two-dimensionally the radiation position; secondary particle detection means for detecting the secondary particles generated from the target upon radiation of the ion beam; and superposition-display means for superposing the secondary particle image with a different kind of image containing such information that is not contained in the secondary particle image, and displaying the resulting image; and which can accurately position the beam radiation position to lower wiring layers of the target such as a semiconductor device that can not be observed by the secondary particle image obtained by scanning the focused ion beam.

REFERENCES:
patent: 3648048 (1972-03-01), Cahan et al.
patent: 4447731 (1984-05-01), Kuni et al.
patent: 4503329 (1985-03-01), Yamaguchi et al.
Okamoto et al., IEEE 7th Int. Conf. on Pattern Recognition Proceedings, 1984, pp. 1361-1364.

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