Apparatus for ion and vapor deposition

Details Apparatus for ion and vapor deposition Apparatus for ion and vapor deposition

1985-12-23

1987-05-05

Pianalto, Bernard D.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to condition of coating material

118715, B05C 1100

Patent

active

046623124

ABSTRACT:
An apparatus for ion and vapor deposition comprises an ion implantation assembly including an ion source, a power supply for the ion source and an accelerator-injector for implanting ions from the ion source, a film forming assembly including an evaporation source and a power supply for the evaporation source, and a control assembly for controlling the two assemblies. The control assembly comprises means for maintaining ion implantation and vapor deposition in a specified ratio at all times when ion implantation and vapor deposition are effected at the same time and, which assures that ion implantation and vapor deposition are effected at the same time in a specified ratio to form a thin film of good quality and strong adhesion.

REFERENCES:
patent: 4559901 (1985-12-01), Morimoto et al.
Andoh et al., "A New Machine for Film Formation by Ion and Vapour Deposition", Ion Implantation Equipement & Techniques, Nuclear Instruments and Methods in Physics Research, B6 (1985), pp. 111-115, North-Holland, Amsterdam.

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