Apparatus for introducing a process gas into a treatment chamber

Details Apparatus for introducing a process gas into a treatment chamber Apparatus for introducing a process gas into a treatment chamber

1985-01-22

1986-02-18

Chiesa, Richard L.

Gas and liquid contact apparatus

Fluid distribution

Valved

55226, 55236, 55260, 159 4B, 159 4S, 261 79A, 261 89, 159 401, 159 43, B01F 304

Patent

active

045713111

ABSTRACT:
A process gas is introduced into a treatment chamber (40) through a horizontal spiral gas supply duct (30) having a tangential inlet (31) and opening to a pair of concentric, inner and outer annular gas inlet ducts (12,22) surrounding a liquid spray apparatus (2). Partition means (32) divide the spiral supply duct (30) into independent inner and outer sub-ducts (34,36) which define separate inner and outer flow passages (44,46) connected respectively to the inner and outer annular gas inlet ducts (12,22). Damper means (70) is provided in the inlet to the outer sub-duct (36) to selectively control the flow of process gas (7) therethrough as a means of maintaining the velocity of the flow of process gas (5) through the inner flow passage (44) above a minimum acceptable velocity.

REFERENCES:
patent: 1961956 (1934-06-01), Bleibtreu et al.
patent: 2670036 (1954-02-01), Spalding
patent: 3225523 (1965-12-01), Wiebe
patent: 3761065 (1973-09-01), Rich et al.
patent: 3803723 (1974-04-01), Lamm et al.
patent: 4226603 (1980-10-01), Larsson et al.
patent: 4227896 (1980-10-01), Larsson et al.
patent: 4260563 (1981-04-01), Brulhet
patent: 4320092 (1982-03-01), Kondo et al.
patent: 4481171 (1984-11-01), Baran et al.

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