Coating apparatus – With indicating – testing – inspecting – or measuring means
Reexamination Certificate
2007-08-14
2007-08-14
Moore, Karla (Department: 1763)
Coating apparatus
With indicating, testing, inspecting, or measuring means
C118S713000, C356S073000, C156S345240
Reexamination Certificate
active
10842479
ABSTRACT:
The present invention relates to an integrated apparatus for monitoring wafers and for process control in the semiconductor manufacturing process, by means of at least two different measurements that can be installed inside any part of the semiconductor production line, i.e., inside the photocluster equipment, the CVD equipment or the CMP equipment. The apparatus comprises a measuring unit for performing at least one optical measurement in predetermined sites on said wafer, illumination sources for illuminating said wafer via measuring unit, supporting means for holding, rotating and translating the wafer and a control unit. The measuring unit comprises: at least two measuring sub-units, one of them being normal-incidence optical measuring system.
REFERENCES:
patent: 4618938 (1986-10-01), Sandland et al.
Dekel Patent Ltd
Klein David
Moore Karla
Nova Measuring Instruments Ltd.
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