Image analysis – Applications – Manufacturing or product inspection
Patent
1997-10-22
1998-07-14
Shalwala, Bipin
Image analysis
Applications
Manufacturing or product inspection
348126, 348130, 382145, 382149, 356389, G06K 900, H04N 718, G01B 1100
Patent
active
057816573
ABSTRACT:
Graphic data for forming a light-shielding pattern and graphic data for forming a semitransparent pattern are stored in first and second memories, respectively. A synthesis circuit converts the graphic data stored in the first and second memories into bit patterns and writes them in a third memory. A line width determination circuit determines, as a halftone region, a region having the number of continuous bits at the same level, which number is a predetermined number or less, in the bit patterns stored in the third memory. A pattern data generation circuit generates pattern data constituted by the signal levels of a light-transmitting region and a light-shielding region on the basis of an output signal from the synthesis circuit. A pattern data correction circuit corrects the signal level of the pattern data corresponding to the halftone region designated by the line width determination circuit to a signal level corresponding to a semitransparent film in accordance with the transmittance of the semitransparent film. A comparator compares the corrected pattern data output from the pattern data correction circuit with a signal output from a line sensor and corresponding to a halftone type phase shift mask to be inspected, thereby inspecting the patterns.
REFERENCES:
patent: 3997912 (1976-12-01), Zsagar
patent: 4479145 (1984-10-01), Azuma et al.
patent: 4718767 (1988-01-01), Hazama
patent: 4805123 (1989-02-01), Specht et al.
patent: 4962541 (1990-10-01), Doi et al.
patent: 5119434 (1992-06-01), Bishop et al.
patent: 5163102 (1992-11-01), Yamazaki et al.
patent: 5253306 (1993-10-01), Nishio
patent: 5286581 (1994-02-01), Lee
patent: 5321767 (1994-06-01), Murase
patent: 5379348 (1995-01-01), Watanabe et al.
patent: 5442714 (1995-08-01), Iguchi
patent: 5481624 (1996-01-01), Kamon
Kabushiki Kaisha Toshiba
Shalwala Bipin
LandOfFree
Apparatus for inspecting pattern of photomask and method therefo does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for inspecting pattern of photomask and method therefo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for inspecting pattern of photomask and method therefo will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1891419