Apparatus for inspecting average size of fundamental patterns

Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356394, G01B 1100, G01B 902

Patent

active

044088833

ABSTRACT:
An apparatus for determining the average size of fundamental patterns contained in a given region of an object to be inspected, which includes Fourier transform means for producing output data corresponding to a Fourier transform pattern image of the given region of the object, and processor means for processing the output data to provide the actual pattern size information. The Fourier transform means includes a Fourier converter for providing the output data corresponding to Fourier transform patterns. The processor means includes an extractor coupled to the Fourier transform means for extracting a single magnitude data (I.sub.n) representing the order n of spatial frequency component (e.g. 200) from the output data, the magnitude of the order n component changing with variation (e.g. .DELTA.a.sub.H) of the size of patterns; and a data processor coupled to the extractor for determining the average size of patterns in the given region according to the single magnitude (I.sub.n) and providing the actual pattern size information indicating the averge size of the patterns.

REFERENCES:
patent: 3441351 (1969-04-01), Bell et al.
patent: 3806251 (1974-04-01), Dandliker et al.
patent: 3954337 (1976-05-01), Ragland, Jr.
patent: 4200396 (1980-04-01), Kleinknecht et al.
patent: 4298285 (1981-11-01), Ito
IBM Journal of Research and Development, "Dimensional Measurement and Defect Detection Using Spatial Filtering",. A. L. Flamholz et al., No. 6, Nov. 1973.
Chapman et al., "A Fourier Transform Method for the Verification of Wire Screens for Standard Sieves" Jr. Phys. E. Sci. Instru. 6-1977 pp. 621-626.
Dickey et al., "An Optical Open Area Ratiometer" Optical Engineering" 9/10/80, pp. 793-796 & SPIE Seminar Feb. 6/7/80, L. A. Cal.
Firseter et al., "Method for Measuring the Average Aperture Size of a Plurality of Apertures in a Kinescope Shadow Mask" RCA Tech. Note 1143, 3/76.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for inspecting average size of fundamental patterns does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for inspecting average size of fundamental patterns, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for inspecting average size of fundamental patterns will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1272376

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.