Apparatus for indiffusing dopants into semiconductor material

Details Apparatus for indiffusing dopants into semiconductor material Apparatus for indiffusing dopants into semiconductor material

1974-11-19

1977-05-03

Stein, Mervin

Coating apparatus

With cutting, punching or tearing of work

Web or sheet work

13 20, 219390, C23C 1308

Patent

active

040207919

ABSTRACT:
Apparatus for indiffusing dopant into a semiconductor material. The apparatus comprises a heatable tube of the same semiconductor material, the wall of which is from 0.5 to 20 mm thick and is gas-tight under reaction conditions.

REFERENCES:
patent: 2679545 (1954-05-01), Kistler
patent: 2936246 (1960-05-01), Coghill
patent: 2948635 (1960-08-01), Koller
patent: 3099579 (1963-07-01), Spizer et al.
patent: 3293074 (1966-12-01), Nickl
patent: 3441000 (1969-04-01), Burd et al.
patent: 3486933 (1969-12-01), Sussman
patent: 3492969 (1970-02-01), Emeis

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