Apparatus for housing a micromechanical structure and method...

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Insulative housing or support

Reexamination Certificate

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Details

C438S127000, C438S422000, C438S456000, C438S977000, C257SE23128, C257SE23191, C257SE21502

Reexamination Certificate

active

10992627

ABSTRACT:
Apparatus for housing a micromechanical structure, and a method for producing the housing. The apparatus has a substrate having a main side on which the micromechanical structure is formed, a photo-resist material structure surrounding the micromechanical structure to form a cavity together with the substrate between the substrate and the photo-resist material structure, wherein the cavity separates the micromechanical structure and the photo-resist material structure and has an opening, and a closure for closing the opening to close the cavity.

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Tseng, F.G. et al.; “A Novel Fabrication Method of Embedded Micro Channels Employing Simple UV Dosage Control and Antireflection Coating”; IEEE Feb. 2002, pp. 69-72.

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