Abrading – Abrading process – Glass or stone abrading
Patent
1996-04-09
1998-08-11
Eley, Timothy V.
Abrading
Abrading process
Glass or stone abrading
451 63, 451288, 451289, 451290, B24B 502, B24B 2904, B24B 100
Patent
active
057919739
ABSTRACT:
An elastic polishing pad is adhered to the top face of a rotatable table. Above the table is provided a substrate holding apparatus for holding a substrate. The substrate holding apparatus comprises a rotary shaft, a substrate holding head in the form of a disc which is provided integrally with the lower edge of the rotary shaft, a sealing member in the form of a ring which is made of an elastic material and fastened to the peripheral portion of the lower face of the substrate holding head, and a guiding member in the form of a ring which is fastened to the back face of the substrate holding head to be located outside the sealing member. A fluid under pressure is introduced into a fluid flow path formed in the rotary shaft from one end thereof and supplied to a space from the other end of the fluid flow path so as to press the substrate against the polishing pad.
REFERENCES:
patent: 2998680 (1961-09-01), Lipkins
patent: 3731435 (1973-05-01), Boettcher et al.
patent: 4598502 (1986-07-01), Lombard
patent: 4954141 (1990-09-01), Takiyama et al.
patent: 5441444 (1995-08-01), Nakajima
patent: 5449316 (1995-09-01), Strasbaugh
patent: 5476414 (1995-12-01), Hirose et al.
patent: 5584751 (1996-12-01), Kobayashi et al.
patent: 5605488 (1997-02-01), Ohashi et al.
Research Disclosure, Feb. 1991, No. 322, p. 95 "Pressure Wafer Holder for Uniform Polishing".
Eley Timothy V.
Matsushita Electric - Industrial Co., Ltd.
LandOfFree
Apparatus for holding substrate to be polished and apparatus and does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for holding substrate to be polished and apparatus and, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for holding substrate to be polished and apparatus and will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-383260