Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1989-12-26
1991-06-25
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429828, 118730, 118731, C23C 1400, C23C 1600
Patent
active
050264699
ABSTRACT:
An apparatus for holding and turning lenses, particularly for eyeglass lenses to be coated in a high-vacuum vapor deposition or sputtering system. A ring pair carrying the lens to be held is seated on a substrate holder in the process chamber of the high-vacuum system. The substrate holder is a sheet metal part shaped like a half shell, and is rotatable about a vertical axis. A sickle shaped sheet metal blank forms a rake that partially overlaps the substrate holder. The rake is held and guided by a guide ring that is displaceable in the direction of the rotational axis of the substrate holder. The rake is displaceable by a lifting element of a lifting motor secured to the wall of the chamber. The rake includes individual tines having lower edges facing toward the substrate carrier. The tines engage pinions or gear wheels on the individual lens holders. The lens holders are mounted to the substrate via pegs, which allow the lens holders to pivot 180.degree.. The lens holders are pivoted by rotating the substrate holder after the lifting mechanism has lowered the rake, thus permitting engagement between the tines of the rake and the gears or pinions.
REFERENCES:
patent: 2410720 (1946-11-01), Dimmick
patent: 3396696 (1968-08-01), Becker
patent: 3859956 (1975-01-01), Paola
patent: 4329938 (1982-05-01), Mang
patent: 4485759 (1984-12-01), Brandolf
Fliedner Michael
Klingenstein Dieter
Kunkel Georg
Mahr Heinz
Leybold Aktiengesellschaft
Marquis Steven P.
Niebling John F.
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