Apparatus for heat treatment of a substrate

Heating – Accessory means for holding – shielding or supporting work... – Support structure for heat treating ceramics

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

432258, F27D 500

Patent

active

049196146

ABSTRACT:
An apparatus for the heat treatment of a substrate comprises a heat treating plate for heating or cooling a substrate, three holes for one substrate provided on the surface of the heat treating plate whose position is selected to suitably place the substrate, and three balls respectively in the three holes with the diameter of the balls being slightly larger than the depth of the holes. The substrate is retained on the three balls for heat treatment.

REFERENCES:
patent: 1941941 (1934-01-01), Irwin
patent: 2208734 (1940-07-01), Schreiber
patent: 2273475 (1942-02-01), Schreiber
patent: 3266116 (1966-08-01), Rush
patent: 3904352 (1975-09-01), Thurnauer et al.
patent: 3948594 (1976-04-01), Irwin, Jr.
patent: 4362507 (1982-12-01), Antonucci
patent: 4407654 (1983-10-01), Irwin
patent: 4715812 (1987-12-01), von Matuschka et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for heat treatment of a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for heat treatment of a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for heat treatment of a substrate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-31573

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.